Thursday, 8 June 2017

Arrested Precipitation Technique for Synthesis of Chalcogenide and Oxide Thin Films

Arrested Precipitation Technique Interest in the use of photo electrochemical solar cells for low cost energy conversion has led to an extensive research in the search for novel and suitable thin film semiconductor materials. The techniques presently used for synthesis of mixed metal chalcogenide and oxide thin films are CBD, MOCVD, spin coating, electro deposition, spray pyrolysis, sputtering, crystal growth, and chemical bath deposition.

All these deposition techniques require specific sophisticated instrumentation. In this regard APT is more attractive and relatively inexpensive presently used by us for deposition of mixed metal chalcogenide and oxide thin thin films.

In the present investigation we attempt to prepare mixed metal chalcogenide and oxide thin films by arrested precipitation technique. The purpose of work is to establish and optimize the growth condition to produce these thin films.

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